2012-5-11

Introduction of mechanical polishing method of pretreatment suitable                                                                           for sample preparation by argon ion beam equipment. 

提案するフォトギャラリーは簡単な説明する内容です。
This Pre-processing method is suitable for argon ion beam sample preparation. 

Cross-sectional observation by mechanical polishing is a significant technology in the practice of the reliability testing and failure analysis.

Working to improve polishing techniques for more accurate reproduction of the cross section state of mechanical polishing.  

For example, is the result of verification of the optimal combination of liquid and buff the finish to be used in the finishing process of polishing. 

When used in the finishing process of colloidal silica in the polishing of the cross-section of the electronic components, you can get a good smooth surface by adding hydrogen peroxide, ammonia and water.

           General embedding resin method
           General embedding resin method

Mechanical polishing method of the conventional resin embedding will require craftsmanship.   It quickly to deal with sample preparation is difficult.   And it is think in the general resin embedding method is Unreasonable to irradiation in the vertical direction fundamentally. 

Also Ion beam specimen preparation ,think that diversity a somewhat deficient in the processing of electronic components.

because,the equipment specification will be an inconvenience for a few millimeters in height.

This chapter describes how to use the mechanical polishing of suitable pre-treatment to eliminate inconvenience of sample preparation.

優れた多孔質または界面構造を持つ様々な材料を観察するために断面を処理する方法について説明します。
    Resin coating method

     I believe that the potential to achieve unprecedented analysis of electronic components.

このメソッドは、Arイオンの様々な装置に対応することが可能です。

Can provide faster and cheaper than a good sample in the polishing machine if it depends on the processing of Ar ion irradiation.

will introduce a examples that improve the convenience of the Ar ion device by smaller and thinner.

Proposal has provided the following matters: sample preparation by mechanical polishing and argon ion beam processing machine.

        1)There are multiple simultaneous machining various ways.

        2)Resin coating method for printed circuit assembly is unusual.

        3)That does not cause damage to the surface and interface.  

In this section, we introduce the cross-sectional sample preparation in an oblique direction of argon ion irradiation.

Sample images of Ar ion milling
Sample images of Ar ion milling

 

 

It is a state attached to the jig after the mechanical polishing. Is a cylindrical jig for mounting to the equipment of Ar ions.

This sample has been processed by using an argon ion beam milling. Resin embedding method and the method is nearly equivalent.

断面試料を調製するための樹脂コーティング法は効率的かつ効果的です
Resin coating Sample preparation procedure

 

Surface finish machining by argon ion, there is no difference between the embedding resin and the resin coating.

アルゴンイオンビーム加工機による各種電子部品の一例です。
sample preparation by its own polishing machine

 

cross-sectional Processing of a flat cable IDC connector terminal shown in the photo is a unique way.

例えば複数同時加工はD3mm×W5mm×H8mmとD5mm×W5mm×H8mmです。
resin-embedded processing
この写真は簡単な治具に取り付けられた試料の状態です。
Processing of semiconductor itself

Sample preparation by mechanical polishing of small precision parts.

Resin-embedded samples of about 8 cubic mm square.

Bonding wire junction cross section is example of simultaneous machining of two pieces semiconductors.


従来の樹脂埋め込み方法は、試料片を複数同時処理することはできません。基板実装チップ部品の2個の同時処理を写真で説明されています。

 

It is multiple simultaneous processing of different varieties.

Resistor and capacitor is an example of simultaneous processing of two pieces. 

.斜め方向から照射による例を示します。サンプルサイズФ25場合15mmの範囲を処理することができます。

 

 

Devised jig Mounting to the device of Ar ions, the range of the irradiation can be more than three times.

The sample will be in the range of irradiation of 15mm by moving from side to side.

In this section, we introduce the cross-sectional sample preparation in an vertical direction of argon ion irradiation.

サンプルの研磨時間、砥粒#1800で中央付近に約10分です。

Photo after removal of mount components.

To prepare a sample of the height of a few mm, it is possible to polishing one side of the surface mount components.

Base material was thinned to 0.5mm from the processing of 1.6 mm.

Sample preparation by impregnation
Sample preparation by impregnation
10×20サイズ、両面の研磨時間は約20分です。
Double-sided polishing is a sample of thickness 2mm.

Some products of the printed circuit assembly may exceed the height of 14 mm. The total thickness of the PCB is an example of processing to a thickness of 2mm in 14 mm.


サンプルを処理するための模式図。これは、Arイオン機器を活用するために処理すべき一例です。従来の樹脂包埋法では根本的に垂直方向に困難です。 BGAのはんだヌレ性の評価。
sample of the thickness of 2mm by polishing of the plane.

must be processed into a rectangular shape if need an argon ion processing. 

There was an irrational thing that requires a re-processing at the variation in the processing.

It had to be reworked to a thickness of 2mm with a rectangle than cylindrical.

The photograph is a sample of the resin coating method is processed by mechanical polishing.

この章では、機械研磨の適切な措置を説明しています。写真は、高さ5mmの処理状態を示しています。Arイオンの機器の仕様の高さ寸法は7mm未満であり、それが不都合を起こす可能性を秘めています。

The height of the printed circuit assembly has exceeded 12 mm in a state of irregularity.

Point of the photo will be the PCB of 2mm thickness by remove a portion of the PCB surface mount components of the height of 12mm.

これは、処理の例です。接線に近い接合部の断面を参照してください
cross-sectional sample preparation for analyzing the surface.

 

Think a high possibility of analysis by Auger electron spectroscopy.

The length of the dimensions that protrude from the argon ion shielding plate is important.

The center of the wire bond, can handle protruding from the shield plate of about 100μ. 

This state of the LED lamp can be a vertical irradiation.

この写真の断面は、PCBに実装されたLEDランプは研磨機で処理されています。
PCB base material Plane processing.

Must be processed into a 0.5 mm to 1.6mm thickness of the base material in order to secure a sample of 5mm height.

Have prepared a 3mm height because it exceeds the specifications of the of Ar ions.

 

半導体自体の機械的研磨工程は接合部の接線の近傍を処理しています。経験が浅いにもスピーディに完了することができます。
Cross-sectional of semiconductor processing itself.

Mechanical polishing process close to the tangent is the just the way here.

    Processing and machine processing of Ar ion is feel a need a considerable amount of time.

    can reduce the machining time of bonding cross section.

    Gas consumption and shield plate consumable Is reduced.

Describes the new ways to take advantage of this section, the device.

Arイオンビームの垂直方向の試料調製。Arイオンの設備仕様の高さが2未満mmで、それが不都合を起こす可能性を秘めています。デバイスの一部を改善することによって処理能力がアップすることができます。

 

proposal to company certain.

Schematic diagram of the improvement of the sample holder is the contents of the proposal offer.

Mounting of the sample is a little technique is required.

In the standard specification of the argon ion will have no inconvenience in the analysis of printed circuit assembly?

Analysis, you will be able to argon ion milling processing of electronic components mounted on the PCB that was not possible so far.

Proposal is a Modify in the vertical irradiation from oblique irradiation of the device.  

In other words, you can Available both the vertical irradiation and oblique irradiation by use of the jig.

【Considerations for the processing of an Ar ion beam vertical direction】

Argon ion beam sample preparation device think is somewhat lacking the diversity to process electronic components.

That device can not be irradiated with an argon ion beam from the top of the sample depending on the Height of the sample.

will need to lower the sample height as much as possible.

Think it is necessary to consider the review of resin embedding method for processing if want to depend on the Ar ion. 

      will introduce the main ones obtained in the result of careful study currently in progress.

デバイスの機能に対応した治具を活用する方法の概要。

Vertical direction can be irradiated with high sample sizes.
1)Prior confirmation was able to gain a better understanding of equipment manufacturers. 

2)Shield plate moves back and forth, the sample is fixed by the stopper.

3)Samples can mount the Min"H7 × W35 × D15mm size.Max"H21×W10×D15mm

Front view of Ф50 Jig.Will plan joint research with a particular test site.
Schematic diagram of the jig for incorporation into equipment.
Pictured is a portion of the prototype jig know-how.
Photo of prototype jig

 

Its status shows that the Incorporate of stopper and sample.

 

 


1

A really long time, Thank you very much for your attention.

I think it is bad writing.

My English is poor. If you have any questions, Please feel free to contact us.

Finally,Creating Web Sites with the English translation software from the Japanese at service of Google is very pleased.

Once again, thank you to the Google service.

 

Document management.

2012-5-11 (Adding a sentence)

Describes a prototype jig.

Vertical direction can be irradiated with high sample sizes.

Proposal is intended to be used as a vertical irradiation device from oblique irradiation device.

2012-5-27 Adding a sentence. thickness 5mm⇒3mm .Replacement of the photo.